Chemical vapour deposition: precursors, processes and applications (Record no. 7831)

000 -LEADER
fixed length control field 00600nam a2200205Ia 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20200707114048.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 180712s9999 xx 000 0 und d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9780854044658
041 ## - LANGUAGE
Language of text/sound track English
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 620.11
Author Mark CHE
DDC Edition number 23
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Jones, Anthony C., ed.
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Hitchman, Michael L., ed.
245 ## - TITLE STATEMENT
Title Chemical vapour deposition: precursors, processes and applications
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. Cambridge
Name of publisher, distributor, etc. Royal Society of Chemistry
Date of publication, distribution, etc. 2009
300 ## - PHYSICAL DESCRIPTION
Extent xv, 582 p.
500 ## - GENERAL NOTE
General note Includes index.
700 ## - ADDED ENTRY--PERSONAL NAME
9 (RLIN) 101763
Personal name Anthony C Jones, Michael L Hitchman
942 ## - ADDED ENTRY ELEMENTS (KOHA)
item type Books in Stacks (S)
Holdings
Withdrawn status Lost status Damaged status Not for loan Permanent Location Current Location Shelving location Date acquired Source of acquisition Price Full call number Accession Number Date last seen item type
        Engineering Library Engineering Library Science & Technology 2018-07-12 Not Known 0.00 620.11 CHE 250993 2018-07-12 Books in Stacks (S)
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